Is a
Patent attributes
Patent Jurisdiction
Patent Number
Date of Patent
March 13, 2007
Patent Application Number
10690835
Date Filed
October 21, 2003
Patent Primary Examiner
Patent abstract
Photoresist compositions that contain one or more components having sulfonamide and Si substitution. Preferred photoresist compositions of the invention contain an Si-polymer such as a silsesquioxane that has sulfonamide substitution and may be employed in multilayer resist systems. In preferred aspects, the Si-polymer has both sulfonamide substitution as well as moieties that can provide contrast upon exposure to photogenerated acid.
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