US Patent 7189625 Micromachine and manufacturing method
Patent 7189625 was granted and assigned to Nippon Telegraph and Telephone on March, 2007 by the United States Patent and Trademark Office.
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Patent Inventor Names
Hiromu Ishii0
Katsuyuki Machida0
Masami Urano0
Shouji Yagi0
Tomomi Sakata0
Yasuyuki Tanabe0
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Patent abstract
In a micromachine according to this invention, a polyimide film is formed on the surface of each electrode. The polyimide film is formed as follows. A substrate having each electrode and a counterelectrode are dipped in an electrodeposition polyimide solution, and a positive voltage is applied to the electrode. A material dissolved in the electrodeposition polyimide solution is deposited on a surface of the positive-voltage-applied electrode that is exposed in the solution, thus forming a polyimide film on the surface.
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US Patent 07189625 Micromachine and manufacturing method US Patent 7189625 Micromachine and manufacturing method
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Patent Number
071896250
Patent Number
71896250
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Official Website
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Infobox
Is a
Current Assignee
Patent Jurisdiction
Patent Number
071896250
Date of Patent
March 13, 2007
0Patent Application Number
112435500
Date Filed
October 4, 2005
0Official Website
Patent Primary Examiner
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US Patent 07189625 Micromachine and manufacturing method
Infobox
Is a
Current assignee
Patent jurisdiction
Patent number
07189625
Date of patent
March 13, 2007
Patent application number
11243550
Date Filed
October 4, 2005
Patent primary examiner
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