Is a
Patent attributes
Patent Jurisdiction
Patent Number
Patent Inventor Names
Woo-sik Jun0
Hoon Kang0
Ju-hyuk Kim0
Seung-uk Lee0
Byung-uk Kim0
Dae-youn Park0
Date of Patent
March 27, 2007
Patent Application Number
11174872
Date Filed
July 5, 2005
Patent Primary Examiner
Patent abstract
The present invention provides a photoresist composition and more particularly, a photoresist composition comprising a) a novolak resin, b) a diazide compound, and c) a solvent containing propylene glycol methyl ether acetate (PGMEA) and 2,2,4-triemthyl-1,3-penthanediolmonoisobutylate (TMPMB). The photoresist composition according to the invention has excellent coating uniformity and stain inhibitory properties after coating so that it can be easily applied to real industrial fields and it can improve working environments due to the reduction of amounts to be consumed, the decrease of time to be required for manufacture, etc. when manufactured on a large scale.
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