US Patent 7198816 Droplet ejection method of forming a film
Patent 7198816 was granted and assigned to Seiko Epson on April, 2007 by the United States Patent and Trademark Office.
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Patent Inventor Names
Katsuyuki Morii0
Takashi Masuda0
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Patent abstract
A droplet ejection patterning method of ejecting a dispersion formed by dispersing a convectable dispersoid in a dispersion medium onto a substrate including a lyophilic region and a lyophobic region. Due to a concentration difference of the dispersion, the dispersoid convects within the dispersion medium toward the edges of the dispersion to form narrow lines of the dispersoid without using photolithography.
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US Patent 07198816 Droplet ejection method of forming a film US Patent 7198816 Droplet ejection method of forming a film
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Patent Number
071988160
Patent Number
71988160
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Current Assignee
Patent Jurisdiction
Patent Number
071988160
Date of Patent
April 3, 2007
0Patent Application Number
103101210
Date Filed
December 4, 2002
0Official Website
Patent Primary Examiner
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US Patent 07198816 Droplet ejection method of forming a film
Infobox
Is a
Current assignee
Patent jurisdiction
Patent number
07198816
Date of patent
April 3, 2007
Patent application number
10310121
Date Filed
December 4, 2002
Patent primary examiner
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