US Patent 7201808 Method and apparatus for rotating a semiconductor substrate

Patent 7201808 was granted and assigned to Applied Materials on April, 2007 by the United States Patent and Trademark Office.

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Patent

Patent attributes

Current Assignee

Applied Materials

Patent Jurisdiction

United States Patent and Trademark Office

Patent Number

7201808

Date of Patent

April 10, 2007

Patent Application Number

10407953

Date Filed

April 4, 2003

Patent Primary Examiner

‌

Michael Barr

Patent abstract

An apparatus that includes a rotatable single wafer holding bracket with one or more wafer supports disposed on the single wafer holding bracket, wherein the one or more wafer supports position a center of a wafer to be off-center from an axis of rotation of the single wafer holding bracket.

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