US Patent 7201829 Mask plate design
Patent 7201829 was granted and assigned to Novellus Systems on April, 2007 by the United States Patent and Trademark Office.
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Patent abstract
The present invention includes a mask plate design that includes at least one or a plurality of channels portions on a surface of the mask plate, into which electrolyte solution will accumulate when the mask plate surface is disposed on a surface of wafer, and out of which the electrolyte solution will freely flow. There are also at least one or a plurality of polish portions on the mask plate surface that allow for polishing of the wafer when the mask plate surface is disposed on a surface of wafer.
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US Patent 07201829 Mask plate design US Patent 7201829 Mask plate design
Infobox
Patent Number
0720182900
Patent Number
720182900
Edits on 1 Apr, 2023
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Infobox
Is a
Current Assignee
Patent Jurisdiction
Patent Number
072018290
Date of Patent
April 10, 2007
0Patent Application Number
099602360
Date Filed
September 20, 2001
0Official Website
Patent Primary Examiner
Edits on 24 Sep, 2022
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Infobox
Is a
Current Assignee
Patent Jurisdiction
Patent Number
072018290
Date of Patent
April 10, 2007
0Patent Application Number
099602360
Date Filed
September 20, 2001
0Official Website
Patent Primary Examiner
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US Patent 07201829 Mask plate design
Infobox
Is a
Current assignee
Patent jurisdiction
Patent number
07201829
Date of patent
April 10, 2007
Patent application number
09960236
Date Filed
September 20, 2001
Patent primary examiner
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