US Patent 7202016 Radiation-sensitive resin composition
Patent 7202016 was granted and assigned to JSR Corporation on April, 2007 by the United States Patent and Trademark Office.
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Patent abstract
A chemically amplified radiation-sensitive resin composition comprising a specific copolymer and a photoacid generator, wherein the copolymer contains the following recurring unit (1) and/or the recurring unit (2), and the recurring unit (3-1),
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US Patent 07202016 Radiation-sensitive resin composition US Patent 7202016 Radiation-sensitive resin composition
Infobox
Patent Number
0720201600
Patent Number
720201600
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Infobox
Is a
Current Assignee
Patent Jurisdiction
Patent Number
072020160
Date of Patent
April 10, 2007
0Patent Application Number
111162690
Date Filed
April 28, 2005
0Official Website
Patent Primary Examiner
Edits on 24 Sep, 2022
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Infobox
Is a
Current Assignee
Patent Jurisdiction
Patent Number
072020160
Date of Patent
April 10, 2007
0Patent Application Number
111162690
Date Filed
April 28, 2005
0Official Website
Patent Primary Examiner
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US Patent 07202016 Radiation-sensitive resin composition
Infobox
Is a
Current assignee
Patent jurisdiction
Patent number
07202016
Date of patent
April 10, 2007
Patent application number
11116269
Date Filed
April 28, 2005
Patent primary examiner
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