Is a
Patent attributes
Patent Jurisdiction
Patent Number
Date of Patent
April 17, 2007
Patent Application Number
10801551
Date Filed
March 17, 2004
Patent Primary Examiner
Patent abstract
A Plasma processing method and apparatus exhibit excellent characteristics of reducing the amount of electric charge on a plasma-processed processing-object substrate and of preventing plasma damage and dielectric breakdown. Before the processing-object substrate is plasma-processed, top-and-bottom surfaces of the processing-object substrate are simultaneously subjected to a weak plasma in gas composed mainly of inert gas, which makes it possible to neutralize the charges on the processing-object substrate. The inert gas is any one of Ar, He, N2, H2, and vaporized H2O gas or a mixed gas of these gases.
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