Is a
Patent attributes
Patent Jurisdiction
Patent Number
Patent Inventor Names
Cheng-ta Wu0
Chun-Chi Chen0
Chang-Cheng Chen0
Date of Patent
April 24, 2007
0Patent Application Number
107796340
Date Filed
February 18, 2004
0Patent Primary Examiner
Patent abstract
A system for processing residual gas that includes a chamber having at least one baffle for increasing gas flow path, a residual gas inlet mechanism connected to the chamber for supplying residual gas to the chamber, at least one first gas inlet mechanism connected to the chamber for supplying inert gas to the chamber, at least one second gas inlet mechanism connected to the chamber for supplying a reactive gas to the chamber, and a gas outlet mechanism for connected to the chamber for outputting mixed gases from mixing the residual gas, inert gas and reactive gas and non-reacted residual gas, inert gas and reactive gas.
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