Is a
Patent attributes
Patent Jurisdiction
Patent Number
Date of Patent
April 24, 2007
Patent Application Number
10819686
Date Filed
April 5, 2004
Patent Primary Examiner
Patent abstract
The invention includes new polymers and methods for providing such polymers and photoresists that comprises the polymers. Methods of the invention include those that comprise providing a reaction mixture and adding over the course of a polymerization reaction one or more polymerization reagents to the reaction mixture to provide the polymer. Photoresists containing a polymer of the invention can exhibit significantly improved lithographic properties.
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