Is a
Patent attributes
Current Assignee
Patent Jurisdiction
Patent Number
Patent Inventor Names
Shoji Iwasa0
Date of Patent
May 1, 2007
0Patent Application Number
106742090
Date Filed
September 29, 2003
0Patent Primary Examiner
Patent abstract
A polishing composition for reducing the haze level of the surface of silicon wafers contains hydroxyethyl cellulose, polyethylene oxide, an alkaline compound, water, and silicon dioxide.
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