US Patent 7211354 Mask substrate and its manufacturing method
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Patent Inventor Names
Masamitsu Itoh0
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Patent abstract
A mask substrate comprises a transparent substrate including a reference mark and a light shielding film formed on the transparent substrate.
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US Patent 07211354 Mask substrate and its manufacturing method US Patent 7211354 Mask substrate and its manufacturing method
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Patent Number
072113540
Patent Number
72113540
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Patent Jurisdiction
Patent Number
072113540
Date of Patent
May 1, 2007
0Patent Application Number
103723960
Date Filed
February 25, 2003
0Official Website
Patent Primary Examiner
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US Patent 07211354 Mask substrate and its manufacturing method
Infobox
Is a
Patent jurisdiction
Patent number
07211354
Date of patent
May 1, 2007
Patent application number
10372396
Date Filed
February 25, 2003
Patent primary examiner
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