US Patent 7212273 Exposure apparatus and method of producing device
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Patent Inventor Names
Shigeru Terashima0
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Patent abstract
To solve the problem, when the inside of an exposure apparatus is placed under vacuum, of a gas being emitted from a resin tube provided in the exposure apparatus, and a component of the gas adhering to and being deposited on the surface of an optical element, so that the optical performances of the optical element and the exposure apparatus are deteriorated, the exposure apparatus is provided with means for controlling the surface temperature of the resin tube in the exposure apparatus up to a predetermined temperature.
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US Patent 07212273 Exposure apparatus and method of producing device US Patent 7212273 Exposure apparatus and method of producing device
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Patent Number
072122730
Patent Number
72122730
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Patent Jurisdiction
Patent Number
072122730
Date of Patent
May 1, 2007
0Patent Application Number
107852520
Date Filed
February 23, 2004
0Official Website
Patent Primary Examiner
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US Patent 07212273 Exposure apparatus and method of producing device
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Is a
Patent jurisdiction
Patent number
07212273
Date of patent
May 1, 2007
Patent application number
10785252
Date Filed
February 23, 2004
Patent primary examiner
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