Patent attributes
When exposing a sample to be oxidized 10 to ozone gas so as to form an oxide film on the surface of the sample, an area to be oxidized is heated locally. Local heating is carried out with a light source 23 for irradiating infrared light the area to be oxidized of the sample on the susceptor 21, and heating means for heating the susceptor. Moreover, when exposing the sample to be oxidized to ozone gas, ozone gas is supplied to the sample while heating the sample under a given pressure. Said pressure is adjusted at 100–44,000 Pa, for example. The flow rate of ozone gas is adjusted, preferably, so that flow of ozone gas in a furnace 20 forms laminar flow. Moreover, it is desirable to provide a light source for emitting ultraviolet light. The light source for emitting ultraviolet light is arranged to irradiate the upstream side of the susceptor 21, for example.
