Is a
Patent attributes
Patent Jurisdiction
Patent Number
Patent Inventor Names
Hajime Nakao0
Date of Patent
May 8, 2007
0Patent Application Number
106941710
Date Filed
October 28, 2003
0Patent Primary Examiner
Patent abstract
A positive type resist composition comprising: (A) a resin having a monocyclic or polycyclic alicyclic hydrocarbon structure, which increases the solubility in an alkali developing solution by the action of an acid; (B) a compound capable of generating an acid upon irradiation with an actinic ray or a radiation; and (C) an alkoxy alcohol as a solvent, wherein an alkoxy group and an alcoholic hydroxyl group are connected to each other via at least three carbons.
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