US Patent 7217496 Fluorinated photoresist materials with improved etch resistant properties

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Patent Jurisdiction

Patent Number

Patent Inventor Names

Wenjie Li0

Kuang-Jung J Chen0

Mahmoud Khojasteh0

Pushkara Rao Varanasi0

Kaushal S. Patel0

Date of Patent

May 15, 2007

Patent Application Number

109881370

Date Filed

November 12, 2004

Patent Primary Examiner

Patent abstract

A photoresist composition including a polymer is disclosed, wherein the polymer includes at least one monomer having the formula:

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