US Patent 7220396 Processes for treating halogen-containing gases
Patent 7220396 was granted and assigned to Battelle Memorial Institute on May, 2007 by the United States Patent and Trademark Office.
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There are disclosed various processes, apparatuses and systems for treating a halogen-containing gas such as F2 that involve generating a plasma in order to reduce chemically the halogen-containing gas into products that are more environmentally manageable. According to a particular embodiment, a reducing agent is mixed with the halogen-containing gas to produce a feed gas mixture and a non-thermal plasma is generated in the feed gas mixture in the presence of liquid water. According to another embodiment, a vaporized portion of a liquid reducing agent is mixed with the halogen-containing gas to produce a reaction mixture and a non-thermal plasma is generated in the reaction gas mixture to reduce the halogen-containing gas.
US Patent 07220396 Processes for treating halogen-containing gases US Patent 7220396 Processes for treating halogen-containing gases
US Patent 07220396 Processes for treating halogen-containing gases
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