Is a
Patent attributes
Patent Jurisdiction
Patent Number
Date of Patent
May 22, 2007
Patent Application Number
11200000
Date Filed
August 10, 2005
Patent Primary Examiner
Patent abstract
A method for manufacturing a semiconductor device includes: forming a semiconductor film on a substrate; performing dehydrogenation for removing hydrogen from the semiconductor film; performing inactivation by terminating a dangling bond of the semiconductor film with a supply of a molecule containing an impurity element to the semiconductor film at a concentration in accordance with a doping quantity; and crystallizing the semiconductor film while doping the impurity element contained in the molecule bonded to the dangling bond to the semiconductor film with a supply of energy to the inactivated semiconductor film, wherein the first to fourth steps are performed in an environment isolated from an atmosphere.
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