US Patent 7221989 Optical metrology model optimization for process control
Patent 7221989 was granted and assigned to Tokyo Electron on May, 2007 by the United States Patent and Trademark Office.
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To evaluate the adequacy of a profile model, one or more types of process control to be used in controlling a fabrication process are selected. Profile model parameters and acceptable ranges for the profile model parameters are selected. A first and second metrology tools are selected. Statistical metric criteria that define an acceptable amount of variation in measurements obtained using the first and second tools are set. A profile model is selected. A measurement of the profile model parameters is obtained using the first tool and the selected profile model. A measurement of the one or more profile model parameters is obtained using the second tool. Statistical metric criteria are calculated based on the measurements of the one or more profile model parameters obtained using the first and second tools. The calculated and set statistical metric criteria are compared to evaluate the adequacy of the selected profile model.
US Patent 07221989 Optical metrology model optimization for process control US Patent 7221989 Optical metrology model optimization for process control
US Patent 07221989 Optical metrology model optimization for process control
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