Is a
Patent attributes
Current Assignee
Patent Jurisdiction
Patent Number
Patent Inventor Names
Cory E. Weber0
Gerhard Schrom0
Ian R. Post0
Mark A. Stettler0
Date of Patent
June 5, 2007
0Patent Application Number
102617150
Date Filed
September 30, 2002
0Patent Primary Examiner
Patent abstract
A method including forming a transistor device having a channel region; implanting a first halo into the channel region; and implanting a second different halo into the channel region. An apparatus including a gate electrode formed on a substrate; a channel region formed in the substrate below the gate electrode and between contact points; a first halo implant comprising a first species in the channel region; and a second halo implant including a different second species in the channel region.
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