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US Patent 7229724 Reticles and methods of forming and using the same

Patent 7229724 was granted and assigned to Micron Technology on June, 2007 by the United States Patent and Trademark Office.

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Patent abstract

Reticles having reticle patterns suitable for reducing edge of array effects are provided. The reticle patterns have unresolvable patterns formed in the periphery areas of the reticle patterns. The unresolvable patterns are non-transparent with respect to patterning radiation. Systems incorporating the reticles are also provided. Additionally, methods of forming and using the reticles are provided.

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