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US Patent 7230258 Plasma-based debris mitigation for extreme ultraviolet (EUV) light source

Patent 7230258 was granted and assigned to Intel on June, 2007 by the United States Patent and Trademark Office.

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Patent abstract

A light source chamber in an Extreme Ultraviolet (EUV) lithography system may include a secondary plasma to ionize debris particles created by the light source and a foil trap to trap the ionize particles to avoid contamination of the collector optics in the chamber.

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