Is a
Patent attributes
Patent Jurisdiction
Patent Number
Patent Inventor Names
Erik Roelof Loopstra0
Stefan Geerte Kruijswijk0
Date of Patent
June 12, 2007
0Patent Application Number
110010830
Date Filed
December 2, 2004
0Patent Primary Examiner
Patent abstract
The invention relates to a lithographic apparatus, a device manufacturing method and a device thus manufactured. The lithographic apparatus is of the scanning type, in which a target portion of a substrate is scanned through a patterned radiation beam. Inhomogeneities in the radiation beam may become visible in the form of stripes on the substrate. By imparting an additional movement to the substrate table and optionally to the patterning device of the apparatus, during scanning, in a direction at an angle with the scanning movement, such inhomogeneities are smeared out, and the overall homogeneity of the illumination may be improved.
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