Patent 7238597 was granted and assigned to Brontek Delta Corp. on July, 2007 by the United States Patent and Trademark Office.
A boron ion plasma, generated by use of a cathodic arc, is manipulated and delivered to a large flat product such as a silicon wafer with boron ion energies suitable for incorporation of boron atoms into solid state devices as one of the key steps in manufacturing solid state electronics and with uniformity of boron dose over the area suitable for the scale of manufacturing desired.