Patent attributes
A retaining wall system is comprised of a plurality of courses of side-by-side parallelogram front face patterns, each parallelogram front face pattern formed by first and second rows of a plurality of quadrilateral face patterns. The first and second rows of the plurality of quadrilateral face patterns have the same width and collectively define a height of the parallelogram front face pattern, with each of the parallelogram front face patterns having the same height. The quadrilateral face patterns in the first row have a width different than that of the quadrilateral face patterns in the second row. Each parallelogram front face pattern in a first course overlies two parallelogram front face patterns in an immediately adjacent course. The combination of off-sets of the quadrilateral face patterns in each parallelogram front face pattern and overlapping of parallelogram face patterns in adjacent courses creates a retaining wall having a non-uniform appearance of a natural stone wall.
