Is a
Patent attributes
Current Assignee
Patent Jurisdiction
Patent Number
Patent Inventor Names
Ling Chen0
Nikolaos Bekiaris0
Christophe Marcadal0
Hua Chung0
Date of Patent
July 17, 2007
0Patent Application Number
107414220
Date Filed
December 19, 2003
0Patent Citations Received
Patent Primary Examiner
Patent abstract
A method for processing substrates is provided. The method includes depositing and etching a low k dielectric layer on a substrate, pre-cleaning the substrate with a plasma, and depositing a barrier layer on the substrate. Pre-cleaning the substrate minimizes the diffusion of the barrier layer into the low k dielectric layer and/or enhances the deposition of the barrier layer.
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