Is a
Patent attributes
Patent Jurisdiction
Patent Number
Date of Patent
July 24, 2007
Patent Application Number
10483036
Date Filed
July 8, 2002
Patent Primary Examiner
Patent abstract
Ammonia-free, HF-free cleaning compositions for cleaning photoresist and plasma ash residues from microelectronic substrates, and particularly to such cleaning compositions useful with and having improved compatibility with microelectronic substrates characterized by sensitive porous and low-k to high-k dielectrics and copper metallization. The cleaning composition contain one or more non-ammonium producing, non-HF producing fluoride salt (non ammonium, quaternary ammonium fluoride salt) in a suitable solvent matrix.
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