US Patent 7247812 Laser annealing apparatus

Patent 7247812 was granted and assigned to AU Optronics on July, 2007 by the United States Patent and Trademark Office.

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Patent

Patent attributes

Current Assignee

AU Optronics

Patent Jurisdiction

United States Patent and Trademark Office

Patent Number

72478120

Patent Inventor Names

Yi-Chang Tsao0

Date of Patent

July 24, 2007

Patent Application Number

102501720

Date Filed

June 10, 2003

Patent Primary Examiner

‌

Geoffrey S. Evans

Patent abstract

An excimer laser annealing apparatus and the application of the same for stabilizing the atmosphere surrounding an area irradiated by an excimer laser. The apparatus includes a chamber, a gas diversion nozzle, an excimer laser and a gas supply device. The gas diversion nozzle is positioned inside the chamber. The laser beam produced by the excimer laser passes through the gas diversion nozzle. The gas supply device connects with the gas diversion nozzle for providing a jet of gas to the laser-irradiated area and carrying away any pollutants from the irradiated area.

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