US Patent 7250083 ALD method and apparatus

Patent 7250083 was granted and assigned to Sundew Technologies on July, 2007 by the United States Patent and Trademark Office.

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Ofer Sneh0

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Patent abstract

A method and an apparatus for executing efficient and cost-effective Atomic Layer Deposition (ALD) at low temperatures are presented. ALD films such as oxides and nitrides are produced at low temperatures under controllable and mild oxidizing conditions over substrates and devices that are moisture- and oxygen-sensitive. ALD films, such as oxides, nitrides, semiconductors and metals, are efficiently and cost-effectively deposited from conventional metal precursors and activated nonmetal sources. Additionally, substrate preparation methods for optimized ALD are disclosed.

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https://pdfpiw.uspto.gov/.piw?Docid=072500830

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