Is a
Patent attributes
Current Assignee
Patent Jurisdiction
Patent Number
Patent Inventor Names
Kenji Okamoto0
Yong Wang0
Adam Safir0
Dominique Charmot0
Didier Benoit0
Han-Ting Chang0
Isao Nishimura0
Date of Patent
July 31, 2007
0Patent Application Number
108771100
Date Filed
June 25, 2004
0Patent Primary Examiner
Patent abstract
The present invention is directed to the preparation of photoresist polymers via living free radical polymerization techniques. Sterically bulky ester monomers are utilized as the polymerization components. Use of chain transfer agents is included in polymerization processing conditions. Cleavage of polymer terminal end groups that include a heteroatom are described.
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