Patent attributes
A topography analyzing system (10) for analyzing a topographic microstructure is provided. The topography analyzing system includes a three-dimensionally adjustable platform (12), a loading platform (13), a microscopic viewing device (14), a topography measuring device (11), and a mirror (15). The adjustable platform is adapted for adjusting the spatial positions of itself and what is loaded thereon. The loading platform is disposed on the adjustable platform and is adapted for having a workpiece (17) to be evaluated loaded thereon. The topography measuring device is aside/adjacent the adjustable platform. The topography measuring device includes a probe extending to and overhanging the workpiece for detecting topography of the workpiece. The mirror is secured at an adjustable angle relative to the three-dimensional adjustable platform and is adapted for forming a mirror image of the probe and a selected measuring area of the workpiece.
