Is a
Patent attributes
Patent Jurisdiction
Patent Number
Date of Patent
August 14, 2007
0Patent Application Number
111793640
Date Filed
July 12, 2005
0Patent Primary Examiner
Patent abstract
The present invention provides for a light-sensitive photoresist composition useful for imaging thick films, comprising a polymer which is insoluble in an aqueous alkali developer but becomes soluble prior to development, a photoacid generator which produces a strong acid upon irradiation and a photobleachable dye. The invention further provides for a process for imaging the photoresist of the present invention, especially where the thickness of the photoresist is up to 200 microns and where the process comprises a single exposure step.
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