Is a
Patent attributes
Patent Jurisdiction
Patent Number
Date of Patent
August 14, 2007
Patent Application Number
10808193
Date Filed
March 24, 2004
Patent Primary Examiner
Patent abstract
A method for forming a capacitor insulation film includes the step of depositing a monoatomic film made of a metal by supplying a metal source including the metal and no oxygen, and depositing a metal oxide film including the metal by using a CVD technique. The method provides the metal oxide film having higher film properties with a higher throughput.
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