Is a
Patent attributes
Patent Jurisdiction
Patent Number
Date of Patent
August 14, 2007
Patent Application Number
11018928
Date Filed
December 22, 2004
Patent Primary Examiner
Patent abstract
A lithographic method and apparatus comprises an illumination system that supplies a beam of radiation, a patterning device that patterns the beam, and a projection system that projects the patterned beam onto a target portion of a substrate. A metrology system is provided adjacent the projection system for aligning the substrate with the projection system. Two or more movable chucks are each arranged to support a substrate and move between a loading device and the projection system. The chucks are independently movable so that one substrate can be passed through the metrology system and patterned beam while the other substrates are moved between the loading system and projection system.
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