Is a
Patent attributes
Patent Jurisdiction
Patent Number
Date of Patent
August 21, 2007
0Patent Application Number
108727250
Date Filed
June 21, 2004
0Patent Primary Examiner
Patent abstract
The present invention relates to a method for manufacturing a flash memory device. A plurality of conductive layers and dielectric layers are etched in a single etch apparatus, thus forming a control gate and a floating gate. In a gate formation process in which a thickness of a floating gate is over 1500 Å, problems in short process time and short mass production margin in an existing process can be solved while completely stripping a dielectric layer fence.
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