US Patent 7261919 Silicon carbide and other films and method of deposition
Patent 7261919 was granted and assigned to FLX Micro on August, 2007 by the United States Patent and Trademark Office.
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Patent abstract
A method of depositing a ceramic film, particularly a silicon carbide film, on a substrate is disclosed in which the residual stress, residual stress gradient, and resistivity are controlled. Also disclosed are substrates having a deposited film with these controlled properties and devices, particularly MEMS and NEMS devices, having substrates with films having these properties.
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US Patent 07261919 Silicon carbide and other films and method of deposition US Patent 7261919 Silicon carbide and other films and method of deposition
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Patent Number
0726191900
Patent Number
726191900
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Official Website
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Infobox
Is a
Current Assignee
Patent Jurisdiction
Patent Number
072619190
Date of Patent
August 28, 2007
0Patent Application Number
107160060
Date Filed
November 18, 2003
0Official Website
Patent Primary Examiner
Edits on 26 Sep, 2022
Golden AI
Infobox
Is a
Current Assignee
Patent Jurisdiction
Patent Number
072619190
Date of Patent
August 28, 2007
0Patent Application Number
107160060
Date Filed
November 18, 2003
0Official Website
Patent Primary Examiner
Edits on 16 Jun, 2022
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Edits on 22 Nov, 2021
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US Patent 07261919 Silicon carbide and other films and method of deposition
Infobox
Is a
Current assignee
Patent jurisdiction
Patent number
07261919
Date of patent
August 28, 2007
Patent application number
10716006
Date Filed
November 18, 2003
Patent primary examiner
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