Is a
Patent attributes
Patent Jurisdiction
Patent Number
Date of Patent
September 11, 2007
Patent Application Number
11158694
Date Filed
June 22, 2005
Patent Citations Received
...
Patent Primary Examiner
Patent abstract
The invention is directed to a chemical-mechanical polishing pad substrate comprising a microporous closed-cell foam characterized by a narrow pore size distribution in the range of about 0.01 microns to about 10 microns. The polishing pad is produced by foaming a solid polymer sheet with a supercritical gas under an elevated temperature and pressure until the sheet is saturated with gas. The invention is further directed to a polishing pad comprising the polishing pad substrate, a method of polishing comprising the use of the polishing pad substrate, and a chemical-mechanical apparatus comprising the polishing pad substrate.
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