US Patent 7267911 Stencil mask and its manufacturing method
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Patent Inventor Names
Takeshi Shibata0
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Patent abstract
A stencil mask has a silicon thin film in which an opening pattern is formed, a silicon oxide film, and a support part. The silicon thin film has a two-layer structure of a first silicon thin film and a second silicon thin film stacked one on top of the other. The first and second silicon thin films enable microscopic openings to be made in them. Stacking the first and second silicon thin films one on top of the other makes it possible to achieve the necessary strength and increase the strength of the stencil mask.
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US Patent 07267911 Stencil mask and its manufacturing method US Patent 7267911 Stencil mask and its manufacturing method
Infobox
Patent Number
072679110
Patent Number
72679110
Edits on 23 Sep, 2022
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Patent Jurisdiction
Patent Number
072679110
Date of Patent
September 11, 2007
0Patent Application Number
107430070
Date Filed
December 23, 2003
0Official Website
Patent Primary Examiner
Edits on 17 Jun, 2022
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US Patent 07267911 Stencil mask and its manufacturing method
Infobox
Is a
Patent jurisdiction
Patent number
07267911
Date of patent
September 11, 2007
Patent application number
10743007
Date Filed
December 23, 2003
Patent primary examiner
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