Is a
Patent attributes
Current Assignee
Patent Jurisdiction
Patent Number
Date of Patent
September 18, 2007
Patent Application Number
11160853
Date Filed
July 12, 2005
Patent Primary Examiner
Patent abstract
The present invention discloses a STI-first process for making trench DRAM devices. According to the preferred embodiment, the etching recipe for etching the STI region in the memory array is completely compatible with the logic STI process.
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