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US Patent 7274266 Radio frequency excitation arrangement

OverviewStructured DataIssuesContributorsActivity
Is a
Patent
Patent
0
Date Filed
February 10, 2006
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Date of Patent
September 25, 2007
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Patent Application Number
11351929
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Patent Citations Received
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US Patent 12125673 Pulsed voltage source for plasma processing applications
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US Patent 11984306 Plasma chamber and chamber component cleaning methods
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US Patent 12106938 Distortion current mitigation in a radio frequency plasma processing chamber
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US Patent 12111341 In-situ electric field detection method and apparatus
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US Patent 11699572 Feedback loop for controlling a pulsed voltage waveform
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US Patent 11776788 Pulsed voltage boost for substrate processing
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US Patent 11776789 Plasma processing assembly using pulsed-voltage and radio-frequency power
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US Patent 11791138 Automatic electrostatic chuck bias compensation during plasma processing
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US Patent 11887813 Pulsed voltage source for plasma processing
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US Patent 11948780 Automatic electrostatic chuck bias compensation during plasma processing
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•••
Patent Inventor Names
Thomas Kirchmeier
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Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
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Patent Number
7274266
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Patent Primary Examiner
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Joseph Chang
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