Is a
Patent attributes
Patent Jurisdiction
Patent Number
Date of Patent
October 2, 2007
Patent Application Number
11263430
Date Filed
October 31, 2005
Patent Primary Examiner
Patent abstract
Antireflective compositions characterized by the presence of an Si-containing polymer having pendant chromophore moieties are useful antireflective coating/hardmask compositions in lithographic processes. These compositions provide outstanding optical, mechanical and etch selectivity properties while being applicable using spin-on application techniques. The compositions are especially useful in lithographic processes used to configure underlying material layers on a substrate, especially metal or semiconductor layers.
Timeline
No Timeline data yet.
Further Resources
No Further Resources data yet.
