Is a
Patent attributes
Patent Jurisdiction
Patent Number
Patent Inventor Names
Woo Sik Yoo0
Date of Patent
October 2, 2007
0Patent Application Number
110617120
Date Filed
February 18, 2005
0Patent Primary Examiner
Patent abstract
A copper film is treated by applying light at short wavelengths, e.g., at less than 0.6 μm, to heat the copper film and generate a large temperature gradient from the surface of the copper to the interface between the copper and underlying silicon. As a result, grain growth in the copper is enhanced.
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