Is a
Patent attributes
Patent Jurisdiction
Patent Number
Date of Patent
October 9, 2007
Patent Application Number
11031003
Date Filed
January 10, 2005
Patent Citations Received
Patent Primary Examiner
Patent abstract
In a dry etching step for an organic material film, a fluorine-containing member is disposed to the periphery of a semiconductor substrate disposed on a lower electrode or a tray for wafer transportation to form fluorine (fluoro-radicals) from the member per se in addition to the fluoric gas added to the etching gas, with a purpose of removing reaction products, thereby removing reaction products deposited on the semiconductor substrate efficiently and stably.
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