Is a
Patent attributes
Current Assignee
Patent Jurisdiction
Patent Number
Date of Patent
October 30, 2007
Patent Application Number
10672353
Date Filed
September 25, 2003
Patent Primary Examiner
Patent abstract
A sputtering target contains a target material including as constituent elements Ag, In, Te and Sb with the respective atomic percents (atom. %) of α, β, γ and δ thereof being in the relationship of 0.5≦α<8, 5≦γ≦23, 17≦γ≦38, 32≦δ≦73, α≦γ, and α+β+γ+δ=100, and a method of producing the above sputtering target is provided.
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