Is a
Patent attributes
Current Assignee
Patent Jurisdiction
Patent Number
Patent Inventor Names
Akihiro Hayashi0
Haruo Iwasawa0
Tsutomu Shimokawa0
Date of Patent
October 30, 2007
0Patent Application Number
103090170
Date Filed
December 4, 2002
0Patent Primary Examiner
Patent abstract
A radiation-sensitive resin composition comprising (A) an acid-dissociable group-containing polysiloxane and (B) a photoacid generator containing trifluoromethane sulfonic acid or a compound which generates an acid of the following formula (I),
Timeline
No Timeline data yet.
Further Resources
No Further Resources data yet.
