Is a
Patent attributes
Patent Jurisdiction
Patent Number
Date of Patent
October 30, 2007
Patent Application Number
11063940
Date Filed
February 23, 2005
Patent Primary Examiner
Patent abstract
A topcoat material for applying on top of a photoresist material is disclosed. The topcoat material comprises at least one solvent and a polymer which has a dissolution rate of at least 3000 Å/second in aqueous alkaline developer. The polymer contains a hexafluoroalcohol monomer unit comprising one of the following two structures:
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