Is a
Patent attributes
Current Assignee
Patent Jurisdiction
Patent Number
Patent Inventor Names
Sanjay Rajaram0
Manoocher Birang0
David A. Chan0
Bret W. Adams0
Boguslaw A. Swedek0
Date of Patent
November 13, 2007
0Patent Application Number
114671160
Date Filed
August 24, 2006
0Patent Citations Received
Patent Primary Examiner
Patent abstract
A computer-implemented method for process control in chemical mechanical polishing in which an initial pre-polishing thickness of a substrate is measured at a metrology station, a parameter of an endpoint algorithm is determined from the initial thickness of the substrate, a substrates is polished at a polishing station, and polishing stops when an endpoint criterion is detected using the endpoint algorithm.
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