Patent attributes
A mask pattern is employed for multi-pass printing. The mask pattern is the sum of a first mask pattern, relative to a first location that includes areas wherein dots are to be printed when a density value is smaller than a predetermined value, and a second mask pattern, relative to a second location that includes areas wherein dots are to be printed only when the density value is equal to or greater than the predetermined value. Using multiple scans, up to one dot is printed in the first region, while two dots or more are printed in the second region. With this arrangement, since the first mask pattern, which greatly affects a low-duty image, and the second mask pattern, which greatly affects a high-duty image, can be independently designed, problems that occur with images prepared at individual duties can be coped with by the separate mask patterns.
