Is a
Patent attributes
Patent Jurisdiction
Patent Number
Patent Inventor Names
Tuguto Maruko0
Date of Patent
December 4, 2007
0Patent Application Number
115921490
Date Filed
November 3, 2006
0Patent Primary Examiner
Patent abstract
A photomask includes a main mask pattern having first chip patterns and having a first size corresponding to a maximum exposure area of a projection exposure apparatus. The mask further includes a sub-mask pattern having second chip patterns different from the first chip patterns, having a second size smaller than the first size, and arranged adjacently to the main mask pattern.
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