Is a
Patent attributes
Patent Jurisdiction
Patent Number
Date of Patent
December 4, 2007
Patent Application Number
10711043
Date Filed
August 19, 2004
Patent Primary Examiner
Patent abstract
A photoresist trimming gas compound is provided which will selectively remove a resist foot or scum from the lower portions of sidewalls of a photoresist. Additionally, the trimmer compound hardens or toughens an upper surface of the photoresist thereby strengthening the photoresist. The trimmer compound includes O2 and at least one other gaseous oxide and is typically utilized in a dry etching process after a trench has been formed in a photoresist The other oxide gases, in addition to the O2 may include CO2, SO2 and NO2.
Timeline
No Timeline data yet.
Further Resources
No Further Resources data yet.
